Research on Friction-induced Selective Etching for Low Reflectance Germanium Surface

DOI number:10.3901/JME.2024.23.294

Affiliation of Author(s):西南交通大学

Teaching and Research Group:微纳制造及智能传感技术

Journal:机械工程学报

Funded by:国家自然科学基金青年基金(52003037)、四川省自然科学基金青年基金 (2023NSFSC0977) 和西南交通大学新型交叉学科培育基金 (2682022KJ017、2682023KJ022)资助

Key Words:单晶锗；超低反射率；超构表面；摩擦诱导选择性刻蚀；红外减反结构

Abstract:The single-crystal germanium superstructure surface exhibits remarkable characteristics of low reflectance, while maintaining high infrared refractive index, low absorption, low dispersion, and high-temperature resistance, providing an ideal choice for the development of high-performance infrared optical devices, infrared thermal radiation control, optical coatings, and anti-reflection technologies. Wet selective etching exhibits characteristics such as high efficiency and good uniformity in fabricating specific surface structures, providing advantages in nanofabrication on the surface of various anisotropic materials. However, the anisotropic wet etching characteristics on the surface of single crystal germanium are not significant, which has resulted in slow progress in wet etching processes. Consequently, it is still challenging to achieve the controllable fabrication of nanostructures on single crystal germanium using wet etching methods. Additionally, the processing technology for achieving ultra-low reflectance surfaces on single crystal germanium faces technical challenges such as susceptibility to damage, low efficiency, complex processes,

Co-author:何 旺,陈婷婷,崔立聪,余丙军,钱林茂

First Author:王义飞

Indexed by:EI

Correspondence Author:汪红波*

Discipline:Engineering

Document Type:J

Volume:60

Issue:23

Page Number:294-303

ISSN No.:0577-6686

Translation or Not:no

CN No.:11-2187/TH

Date of Publication:2024-12-01

Included Journals:EI

Links to published journals:http://www.cjmenet.com.cn/CN/10.3901/JME.2024.23.294