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Simple method to measure the etching rate of monocrystalline silicon in KOH solution
Impact Factor:1.102
DOI number:10.1049/mnl.2017.0628
Journal:Micro & Nano Letters
Co-author:Cheng Chen,Liang Jiang,Peng Zhang,Hongbo Wang,Linmao Qian*
Volume:13
Issue:4
Page Number:481-485
Translation or Not:no
Date of Publication:2018-04-01
Included Journals:SCI
Links to published journals:https://ietresearch.onlinelibrary.wiley.com/doi/full/10.1049/mnl.2017.0628